Single-crystal – oriented-crystal – and epitaxy growth processes; – Processes of growth from liquid or supercritical state – Having pulling during growth
Patent
1994-07-05
1996-02-20
Kunemund, Robert
Single-crystal, oriented-crystal, and epitaxy growth processes;
Processes of growth from liquid or supercritical state
Having pulling during growth
117 33, 117910, 117932, C30B 1508
Patent
active
054920795
ABSTRACT:
The process includes processing a molten phase of semiconductor material ering a solid phase of the material and having a free surface opposite this solid phase, into which, during the crystallization procedure, energy is radiated and material is fed in in granular form, which material floats and is melted. As a result, at the opposite solid/liquid interface, material grows on the solid phase which is drawn downwards in accordance with the growth rate. The process allows mono- or polycrystalline rods or blocks to be obtained. The main advantages of the process are that it can be carried out without melting vessels, it is possible to use granular material, and the energy balance is favorable because of the small amounts of melt.
REFERENCES:
patent: 3194691 (1965-07-01), Dikhoff
patent: 3998686 (1976-12-01), Meiling et al.
patent: 4312700 (1982-01-01), Helmreich et al.
patent: 4358416 (1982-11-01), Yarwood et al.
patent: 4824519 (1989-04-01), Ostrogorsky
patent: 4834832 (1989-05-01), Stock et al.
patent: 5108720 (1992-04-01), Bourbina et al.
Angres Ulrich
Geissler Joachim
Kunemund Robert
Wacker-Chemitronic Gesellschaft fur Elektronik-Grundstoffe mbH
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