Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent
1978-07-11
1980-07-08
Kimlin, Edward C.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
430496, 430319, 430524, 430531, 430434, G03C 500, G03C 176
Patent
active
042115604
ABSTRACT:
A process for producing an image which comprises the steps of:
(1) applying to the surface of a substrate the surface of a photosensitive layer, the other surface of the photosensitive layer being adhered to a substantially transparent film support which is soluble or dispersible in a developer consisting essentially of a liquid capable of substantially dissolving or dispersing therein the areas of the layer other than those having a polymeric image produced by imagewise exposure in the step (2) below;
(2) exposing the photosensitive layer, imagewise, to actinic radiation to form a polymeric image in the layer; and
(3) washing away with the developer the film support and the areas of the layer other than those having the polymeric image to form an image of a polymeric material on the substrate. The photosensitive element having on its one side the above-mentioned specific film support and the process have a variety of applications and are useful for producing photoresists which are advantageously used for making printed circuit boards.
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patent: 3832176 (1974-08-01), Veastraete
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patent: 4072527 (1978-02-01), Fan
patent: 4126466 (1978-11-01), Roos
Fujikawa Noboru
Kohno Mitsuo
Satake Kunio
Taguchi Tadashi
Yoshitake Katsumi
Asahi Kasei Kogyo Kabushiki Kaisha
Kimlin Edward C.
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