Process for producing icosahedral materials

Details Process for producing icosahedral materials Process for producing icosahedral materials

1987-06-23

1988-09-20

Niebling, John F.

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20419212, C23C 1440

Patent

active

047723700

ABSTRACT:
A method for producing quasi-crystalline films by direct vapor deposition through sputtering is provided. The method is applicable to all alloys which can be converted to quasi-crystalline structure by melt spinning.

REFERENCES:
patent: 4173606 (1979-11-01), Stoy et al.
patent: 4511614 (1985-04-01), Greeson et al.
patent: 4533441 (1985-08-01), Gamblin
patent: 4621031 (1986-11-01), Scruggs
Brian Chapman, Glow Discharge Processes, John Wiley & Sons, New York, 1980, p. 201-203.

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