Process for producing hard masks

Details Process for producing hard masks Process for producing hard masks

2006-03-28

2006-03-28

Young, Christopher G. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S312000, C430S313000, C430S314000, C430S320000, C430S322000, C430S323000, C430S324000, C430S325000, C430S326000, C430S329000

Reexamination Certificate

active

07018748

ABSTRACT:
In a process for producing hard masks, an initiator layer that contains an initiator component is applied to a substrate. Then, a photoresist is used to produce a pattern on the initiator layer, in the trenches of which pattern the initiator layer is uncovered. Then, a curable hard mask material is applied and selectively cured, so that only those sections of the hard mask material that adjoin the initiator layer are cured. Finally, uncured hard mask material is removed using a solvent, and at the same time the lands formed from the resist are also removed. The pattern obtained in this way can then be transferred to the substrate, for example using plasma.

REFERENCES:
patent: 5234793 (1993-08-01), Sebald et al.
patent: 2002/0172898 (2002-11-01), Forester

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