Process for producing deposition films

Coating processes – Electrical product produced – Welding electrode

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427 86, B05D 306

Patent

active

046831460

ABSTRACT:
A process for producing deposition films is provided which comprises forming a gaseous atmosphere of at least one compound silicon hydride selected from the group consisting of;

REFERENCES:
patent: 3490961 (1970-01-01), Frieser et al.
patent: 4348428 (1982-09-01), Rockley et al.
patent: 4363828 (1982-12-01), Brodsky et al.
patent: 4448801 (1984-05-01), Fukuda et al.
patent: 4495218 (1985-01-01), Azuma et al.

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