Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1989-08-24
1991-03-26
Nguyen, Nam X.
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419224, 505731, 427 34, C23C 1434, B05D 100
Patent
active
050026488
ABSTRACT:
An inorganic thin film is deposited on a substrate by sputtering a sputter target by cathode sputtering in the vicinity of the substrate. To produce the target, at least two pulverulent starting components are mixed. The mixture is tempered if a uniform reaction product can be obtained in this process. It is powdered and the powder is deposited on a metallic base by plasma-jet spraying. This produces the target. Preferably, an oxide mixture is tempered which is a starting product for a superconducting ceramic material. In order to convert the thin film deposited to a superconducting state, it is treated for a prolonged time at temperatures of 300.degree.-800.degree. C. in an oxygen-containing atmosphere. The reaction product obtained on tempering may have, for example, the overall composition ZBa.sub.m Cu.sub.n O.sub.x, where 1.5.ltoreq.m.ltoreq.2.5, 2.ltoreq.n.ltoreq.5 and 4.ltoreq.x.ltoreq.9, Z standing for at least one of the elements Y, La, Nd, Sm, Eu, Gd, Dy, Ho, Er, Tm, Yb and Lu, or may have the overall compositions TlBa.sub.l Ca.sub.m Cu.sub.n O.sub.x or BiSr.sub.l Ca.sub.m Cu.sub.n O.sub.x, where 0.3.ltoreq.1.ltoreq.3, 0.3.ltoreq. m.ltoreq.3, 0.3.ltoreq.n.ltoreq.3 and 2.ltoreq.x.ltoreq.11.
REFERENCES:
Qiao et al., "An EM Study . . . Techniques", High Temp. Superconductors II, Extended Abstracts, Apr. 5-9, 1988.
Sawkawa et al., "Superconductivity . . . Spraying", Jap. Journal of Applied Physics, vol. 27, No. 6, 6/1988 pp. 1083-1085.
Konaka et al., "Preparation of . . . Spraying", Jap. Journal of Applied Physics, vol. 27, No. 6, 6/1988 pp. 1092-1093.
Lishi et al., "Plasma Sprayed High Tc Superconductor", Proceedings of the Adriatica Res. Conf. 7/1987.
Fraser et al., "Time Dependent . . . YBa.sub.2 Cu.sub.3 O.sub.7-8 ", High Temp. Superconductors II, Extended Abs., Apr. 1987.
Nakao et al., "Magnetron . . . above 80K", Jap. Journal of Applied Physics, vol. 27, No. 3, 3/1988, pp. 378-380.
Sullivan et al., "BiSrCaCu Oxide . . . sputtering", Appl. Phys. Lett. 52(23), 6 Jun. 1988.
Morach Eugen
Peuckert Marcellus
Schmidt Gunter
Scholch Hans-Peter
Hoechst Aktiengesellschaft
Nguyen Nam X.
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