Process for producing an inorganic thin film on a substrate usin

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

20419224, 505731, 427 34, C23C 1434, B05D 100

Patent

active

050026488

ABSTRACT:
An inorganic thin film is deposited on a substrate by sputtering a sputter target by cathode sputtering in the vicinity of the substrate. To produce the target, at least two pulverulent starting components are mixed. The mixture is tempered if a uniform reaction product can be obtained in this process. It is powdered and the powder is deposited on a metallic base by plasma-jet spraying. This produces the target. Preferably, an oxide mixture is tempered which is a starting product for a superconducting ceramic material. In order to convert the thin film deposited to a superconducting state, it is treated for a prolonged time at temperatures of 300.degree.-800.degree. C. in an oxygen-containing atmosphere. The reaction product obtained on tempering may have, for example, the overall composition ZBa.sub.m Cu.sub.n O.sub.x, where 1.5.ltoreq.m.ltoreq.2.5, 2.ltoreq.n.ltoreq.5 and 4.ltoreq.x.ltoreq.9, Z standing for at least one of the elements Y, La, Nd, Sm, Eu, Gd, Dy, Ho, Er, Tm, Yb and Lu, or may have the overall compositions TlBa.sub.l Ca.sub.m Cu.sub.n O.sub.x or BiSr.sub.l Ca.sub.m Cu.sub.n O.sub.x, where 0.3.ltoreq.1.ltoreq.3, 0.3.ltoreq. m.ltoreq.3, 0.3.ltoreq.n.ltoreq.3 and 2.ltoreq.x.ltoreq.11.

REFERENCES:
Qiao et al., "An EM Study . . . Techniques", High Temp. Superconductors II, Extended Abstracts, Apr. 5-9, 1988.
Sawkawa et al., "Superconductivity . . . Spraying", Jap. Journal of Applied Physics, vol. 27, No. 6, 6/1988 pp. 1083-1085.
Konaka et al., "Preparation of . . . Spraying", Jap. Journal of Applied Physics, vol. 27, No. 6, 6/1988 pp. 1092-1093.
Lishi et al., "Plasma Sprayed High Tc Superconductor", Proceedings of the Adriatica Res. Conf. 7/1987.
Fraser et al., "Time Dependent . . . YBa.sub.2 Cu.sub.3 O.sub.7-8 ", High Temp. Superconductors II, Extended Abs., Apr. 1987.
Nakao et al., "Magnetron . . . above 80K", Jap. Journal of Applied Physics, vol. 27, No. 3, 3/1988, pp. 378-380.
Sullivan et al., "BiSrCaCu Oxide . . . sputtering", Appl. Phys. Lett. 52(23), 6 Jun. 1988.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Process for producing an inorganic thin film on a substrate usin does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for producing an inorganic thin film on a substrate usin, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for producing an inorganic thin film on a substrate usin will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-615300

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.