Process for producing a transparent layer with low resistivity

Details Process for producing a transparent layer with low resistivity Process for producing a transparent layer with low resistivity

1989-07-07

1991-04-30

Weisstuch, Aaron

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

204192290, C23C 1454

Patent

active

050115855

ABSTRACT:
A method for depositing on glass, by reactive cathode sputtering, a layer of indium tin oxide with low resistivity and high transparency, where a layer with at least a minimum intrinsic absorption coefficient is deposited and then a heat treatment, including of one reducing phase, is performed.

REFERENCES:
patent: 3655545 (1972-04-01), Gillery et al.
patent: 3749658 (1973-07-01), Vossen, Jr.
patent: 4407709 (1983-10-01), Enjouji et al.

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