Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Reexamination Certificate
2007-01-16
2007-01-16
Lee, Sin (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
C430S311000, C430S325000, C430S326000, C430S270100, C430S910000
Reexamination Certificate
active
10937853
ABSTRACT:
According to the present invention, a resist resin having in its structure a specific bridged-bond-containing aliphatic ring, and a resist composition comprising the same are provided. By using this resist composition, a resist pattern excellent in both transparency against short-wavelength light and dry-etching resistance can be formed by alkali development with high resolution.
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Asakawa Koji
Okino Takeshi
Saito Satoshi
Shida Naomi
Ushirogouchi Toru
Lee Sin
Oblon & Spivak, McClelland, Maier & Neustadt P.C.
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