Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent
1992-06-05
1994-05-17
Kight, III, John
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
430314, 430317, 430323, 257642, 257759, G03C 500
Patent
active
053127161
ABSTRACT:
A process for producing a semiconductor having a thin film of a fluorine resin as a protective film, which comprises coating on the surface of a fluorine resin a photoresist solution containing a surfactant, followed by exposure, development and etching for fine processing of the fluorine resin.
REFERENCES:
patent: 5117272 (1992-05-01), Nomura et al.
Nakamura Masaru
Unoki Masao
Yokotsuka Shunsuke
Asahi Glass Company Ltd.
Kight III John
Truong Duc
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