Coating processes – Direct application of electrical – magnetic – wave – or... – Pretreatment of substrate or post-treatment of coated substrate
Patent
1990-10-24
1993-01-19
Thibodeau, Paul J.
Coating processes
Direct application of electrical, magnetic, wave, or...
Pretreatment of substrate or post-treatment of coated substrate
427128, 427130, 427550, 427548, 428 64, 428 65, 428694, 428900, G11B 500, B05D 500
Patent
active
051806088
ABSTRACT:
A coating type, magnetic disk is produced by applying a magnetic paint containing magnetic powders in a dispersed state to a non-magnetic substrate, thereby forming a magnetic recording film thereon, and applying surface waves to the magnetic recording film in an undried state. By applying the surface waves to the magnetic recording film, dispersibility and orientation of the magnetic powders are improved and a longitudinally oriented, coating type magnetic disk with distinguished electromagnetic properties, such as a high S/N ratio, etc. can be obtained.
REFERENCES:
patent: 2544622 (1948-01-01), Ulmer et al.
patent: 3676216 (1972-07-01), Abitboul
patent: 4330728 (1982-05-01), Solie
patent: 4395447 (1983-07-01), Nakamatsu
patent: 4719480 (1988-01-01), Elrod et al.
patent: 4759775 (1988-07-01), Peterson et al.
Patent Abstracts of Japan, vol. 9, No. 227, 13 Sep. 1985, & JP-A-60 083 224, May 11, 1985.
Patent Abstracts of Japan, vol. 11, No. 194, 23 Jun. 1987, & JP-A-62 018 629, Jun. 27, 1987.
Chiba Katsuyoshi
Fukke Hajime
Inoue Hitoshi
Ishihara Heigo
Katsumoto Masayuki
Hitachi , Ltd.
Resan Stefan A.
Thibodeau Paul J.
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