Process for producing a micromotion mechanical structure

Details Process for producing a micromotion mechanical structure Process for producing a micromotion mechanical structure

1995-03-24

1996-09-10

Powell, William

Etching a substrate: processes

Etching of semiconductor material to produce an article...

1566281, 1566331, 1566311, 216 33, 216 36, 216 41, H01L 21306, B44C 122

Patent

active

055543049

ABSTRACT:
In a micromotion mechanical structure, such as a vibration-type sensor or a step motor, comprising at least one fixed electrode and at least one movable electrode which is moved by electrostatic power applied to the fixed electrode, at least one of the electrodes is formed essentially by a single crystal semiconductor material. The single crystal semiconductor material has various merits of uniform mechanical properties, small internal stress, etc. for use in such electrodes. Such structure has been realized by attaching patterned electrode made of the material to another substrate and then removing or thinning the original substrate carrying the patterned electrodes.

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patent: 5045152 (1991-09-01), Sickafus
patent: 5055731 (1991-10-01), Nihel et al.
patent: 5059556 (1991-10-01), Wilcoxen

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