Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
Patent
1991-09-04
1994-01-04
Resan, Stevan A.
Coating processes
Direct application of electrical, magnetic, wave, or...
Plasma
428408, 428694, 428900, 4271261, 427130, 427131, 427249, 4272552, 427122, G11B 0500, C23C 1600
Patent
active
052758508
ABSTRACT:
A magnetic disk comprising a nonmagnetic substrate, a metallic thin film magnetic layer provided on the substrate and a hard carbon protective layer provided on the magnetic layer, the hard carbon protective layer containing at least one metal element of silicon, germanium, tin and lead, or further containing fluorine, formed by bias plasma CVD treatment, has a high attrition resistance, a high peeling resistance and a high crack resistance or further a higher corrosion resistance.
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IEEE Transactions on Magnetics, vol. MAG-17, No. 4, Jul., 1981 pp. 1376-1379.
Thin Solid Films, 80(1981) 227-234 "Metallurgical and Protective Coatings".
Itoh Makiko
Kitoh Makoto
Kokaku Yuichi
Hitachi , Ltd.
Resan Stevan A.
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