Process for producing a doped semiconductor substrate

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – Diffusing a dopant

Reexamination Certificate

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C438S308000, C438S309000, C438S521000, C438S529000, C438S582000, C438S586000

Reexamination Certificate

active

07078325

ABSTRACT:
A process is described which allows a buried, retrograde doping profile or a delta doping to be produced in a relatively simple and inexpensive way. The process uses individual process steps that are already used in the mass production of integrated circuits and accordingly can be configured for a high throughput.

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