Process for processing waste gases resulting during the producti

Details Process for processing waste gases resulting during the producti Process for processing waste gases resulting during the producti

1982-11-16

1985-05-07

Thomas, Earl C.

Chemistry of inorganic compounds

Silicon or compound thereof

Oxygen containing

423486, 423613, 423618, 55 71, C01B 33113, C01G 1702, C01G 2307

Patent

active

045157626

ABSTRACT:
Waste gases resulting from the production of silicon in connection with the ormation or decomposition of chlorosilanes, which gases always contain hydrogen chloride, can be worked up without removal of the hydrogen chloride. For this purpose, the waste gases which, after separation from the chlorosilanes, only contain hydrogen and hydrogen chloride, are subjected to combustion with addition of air and, after addition of silicon tetrachloride, the result being highly dispersed SiO.sub.2. The hydrogen chloride then remaining in the gaseous phase is returned to the process stream for production of trichlorosilane.

REFERENCES:
patent: 3954945 (1976-05-01), Lange et al.

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