Process for preparing stable photoresist compositions

Details Process for preparing stable photoresist compositions Process for preparing stable photoresist compositions

2011-01-04

2011-01-04

Walke, Amanda C. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C528S395000, C528S408000, C528S482000, C528S501000, C528S50200C

Reexamination Certificate

active

07862983

ABSTRACT:
A composition of matter consisting of a stable solution containing a polymer derived from a solution of a polymer containing trace metals, the derived method comprising the steps of:(a) providing a polymer solution containing a polymer, a first solvent and trace metals;(b) passing said polymer solution through an acidic cation ion exchange material to remove said trace metals therefrom and thereby forming a polymer solution containing free acid radicals;(c) precipitating said polymer from said polymer solution of step b by contacting with a second solvent wherein the polymer is substantially insoluble therein;(d) filtering said solution and said second solvent to thereby form a solid polymer cake; and(e) contacting said cake from step d with sufficient quantities of additional said second solvent in order to remove free acid radicals therefrom.

REFERENCES:
patent: 5021160 (1991-06-01), Wolpert
patent: 6379551 (2002-04-01), Lee et al.
patent: 7371800 (2008-05-01), Sheehan et al.
patent: 2001/0027245 (2001-10-01), Moroishi et al.
patent: 2002/0028911 (2002-03-01), Barnette et al.
patent: 2005/0107547 (2005-05-01), Ohno et al.
patent: 1479700 (2004-11-01), None
patent: WO 9414858 (1994-07-01), None

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