Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1995-04-21
1996-10-15
Hamilton, Cynthia
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430910, 522 85, G03F 7028, G03F 7033
Patent
active
055653022
ABSTRACT:
The present invention provides a process of preparing a waterborne photosensitive resin composition, free of organic solvent, that can be developed with aqueous alkali solution. The method of the present invention is a process for preparing a waterborne photosensitive resin composition, that can form a photosensitive article developable with aqueous alkali solution, by adding an unsaturated compound, a surfactant and a photoinitiator to an aqueous emulsion, and agitating under conditions sufficient to absorb the unsaturated compound into the polymeric particles of the emulsion and to form a stable waterborne photosensitive resin composition.
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Todd et al, "Aqueous Photopolymerisable Coating Compositions", Research Disclosure, No. 18218, Jun. 1979 pp. 300-301.
Chiou et al, "Emulsified Photoresist for Printed Circuit Imaging", MRL Bull. Res. Dev., vol. 2, No. 2 (1988) pp. (13-17).
Brochure for "Aqualine" by Coates ASI.
Hagiwara Yoshichi
Nishikawa Katsue
Samukawa Hiroshi
Hamilton Cynthia
Troffkin Howard J.
W. R. Grace & Co.,-Conn.
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