Process for preparing low electrical contact resistance composit

Details Process for preparing low electrical contact resistance composit Process for preparing low electrical contact resistance composit

1988-04-26

1989-07-18

Weisstuch, Aaron

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

C23C 1434

Patent

active

048490792

ABSTRACT:
A composition of a metallic compound represented by the formula MT, and G is provided by sputtering an M.sub.x G.sub.100-x target. M is a metal selected from the group of titanium, hafnium, zirconium, and mixtures thereof. T is selected from the group of N, C, and mixtures thereof. G is a metal selected from the group of gold, platinum, and palladium. X is an integer from about 65 to about 95. Also provided are substances coated with the composition and process for depositing the composition on substrates.

REFERENCES:
patent: 3574143 (1971-04-01), Vratny
patent: 3630872 (1971-12-01), Reichelt
patent: 4419202 (1983-12-01), Gibson

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