Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1989-02-17
1990-06-12
Nguyen, Nam X.
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
2041922, C23C 1434
Patent
active
049330594
ABSTRACT:
An anisotropic rare earth magnet material is provided by a sputtering technique. The material has structural and magnetic anisotropy. Its composition is represented essentially by the following formula:
REFERENCES:
patent: 4367257 (1983-01-01), Arai et al.
patent: 4484995 (1984-11-01), Pirich et al.
patent: 4608142 (1986-08-01), Gomi et al.
patent: 4610770 (1986-09-01), Saito et al.
patent: 4640755 (1987-02-01), Sato et al.
patent: 4764436 (1988-08-01), Akutsu et al.
patent: 4769282 (1988-09-01), Tada et al.
Masumoto Tsuyoshi
Nakayama Taketoshi
Sugawara Eishu
Nguyen Nam X.
Research Development Corporation of Japan
Tokin Corporation
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