Process for preparation of stabilized oxide thin layers

Details Process for preparation of stabilized oxide thin layers Process for preparation of stabilized oxide thin layers

1994-07-15

1996-04-30

Breneman, R. Bruce

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20419216, 20419222, 20419223, 20419225, 20412929, 427553, 427557, 427165, 427166, 427167, C23C 1434, B05D 306, B05D 506

Patent

active

055121527

ABSTRACT:
A method for improving the quality of a system of layers deposited on a substrate such as glass is provided, in which, the system of layers have an oxide-based surface layer, in particular n-type semi-conductor oxides such as SnO.sub.x, in which the surface layer is subjected to IR irradiation to provide a stabilization of the layer equivalent to or better than with a 48-hour exposure to the air.

REFERENCES:
patent: 4447473 (1984-06-01), Mashida et al.
patent: 4497700 (1985-02-01), Groth et al.
patent: 4842705 (1989-06-01), Mueller
patent: 5229194 (1993-07-01), Lingle et al.
patent: 5264077 (1993-11-01), Fukui et al.

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