Process for preparation of multilayer photosensitive solvent-pro

Details Process for preparation of multilayer photosensitive solvent-pro Process for preparation of multilayer photosensitive solvent-pro

1981-08-26

1982-11-02

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making printing plates

430271, 430273, 430309, 430322, G03C 500

Patent

active

043574165

ABSTRACT:
An improved photosensitive litho element comprises, in order, a support, a non-photosensitive solvent-soluble contiguous layer having an optical density of at least 3.0 in the visible region of the spectrum and a maximum thickness of 0.015 mm, and a solvent-processable photosensitive layer. Dot-etchable contact litho negatives and positives are provided.

REFERENCES:
patent: 3879204 (1975-04-01), Gervay
patent: 4123272 (1978-10-01), Quinn
patent: 4126466 (1978-11-01), Roos

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