Process for plasma deposition

Details Process for plasma deposition Process for plasma deposition

1994-08-23

1996-02-20

Pianalto, Bernard

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

4272553, 4272557, 427402, 427534, 427535, 427579, 427585, B05D 306

Patent

active

054927358

ABSTRACT:
A process for plasma deposition is disclosed, which permits increasing the plasma deposition processing capacity.
In a single substrate processing plasma CVD apparatus, chamber plasma cleaning II is done once for every plural deposition cycles I. If necessary, for each deposition cycle the intensity of the electric field applied between pair electrodes is varied (for instance, increased to an extent corresponding to the deposition capacity reduction).

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