Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent
1985-12-04
1987-12-08
Smith, John D.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
427 96, 430317, H05K 302
Patent
active
047118350
ABSTRACT:
The invention relates to electric circuits formed by depositing a thick layer of conductive, resistive or dielectric paste on a flat substrate. The thick layers are deposited using a squeegee or by silk screen printing. In this first case, the resolution of the patterns is at best 200 microns, limited by the mesh of the silk screen printing screens. For obtaining finer patterns, the thick layer is dried, then masted using a photoresist, whose patterns may have a resolution of 50 microns, with a space of 50 microns. The thick layer is then etched, in its parts not protected by the photoresist mask, using a mixture of organic solvents which have a differential solubility with respect to the thick layer and to the photoresist.
REFERENCES:
patent: 4119480 (1978-12-01), Nishi
patent: 4373019 (1983-02-01), Watanabe
IEEE Transactions on Components, Hybrids, and Manufacturing Technology, vol. CHMT-2, No. 4, Dec. 1979, pp. 428-433, IEEE, New York, U.S.; Y. Watanabe et al.: "Thick-Film Fine Pattern Formation by a Photolithographic Process".
"Thomson-CSF"
Smith John D.
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