Process for obtaining a pattern, in ferromagnetic material havin

Details Process for obtaining a pattern, in ferromagnetic material havin Process for obtaining a pattern, in ferromagnetic material havin

1988-08-05

1990-07-31

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156646, 156651, 156653, 156656, 156657, 1566591, 1566611, 156668, 29603, 20419236, 20419237, 360125, 427130, 427132, B44C 122, B29C 3700, C23F 102, C03C 1500

Patent

active

049448315

ABSTRACT:
Process for obtaining a pattern, particularly of ferromagnetic material, having differently sloping sides and magnetic head having such a pattern.
This process consists of depositing on a ferromagnetic layer (4) resting on a ceramic support (2), a photosensitive resin layer (6), forming by photolithography an opening (8) in said resin layer and then polymerizing said resin in order that the sides (8a) of the opening are inclined, forming a two-layer mask (10a, 12a) on the resin layer partly masking said opening and defining the shape of the pattern to be produced in the ferromagnetic layer, anisotropically etching the resin layer in order to eliminate the unmasked regions of said layer, eliminating the mask, anisotropically eteching the ferromagnetic layer (4) using the etched resin layer as the etching mask (6a) and eliminating the remainder of the resin layer.

REFERENCES:
patent: 4326936 (1982-04-01), Jones
patent: 4443294 (1984-04-01), Suenaga et al.
patent: 4791719 (1988-12-01), Kobayashi et al.
Patent Abstracts of Japan, vol. 10, No. 3, (P.418)(2060).
Patent Abstracts of Japan, vol. 2, No. 115, 25 Sep. 1978.

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