Process for obtaining a lift-off imaging profile

Details Process for obtaining a lift-off imaging profile Process for obtaining a lift-off imaging profile

1997-02-18

1999-07-13

Loring, Susan A.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430269, 4302721, G11B 724, G03C 500, G03C 1492

Patent

active

059225033

ABSTRACT:
A process for obtaining a lift-off imaging profile which comprises the steps of:

REFERENCES:
patent: 4782008 (1988-11-01), Babich et al.
patent: 5705432 (1998-01-01), Lee et al.
IEEE Transactions on Electron Devices, vol. 29, No. 5, May 1992, New York, pp. 834-837, XP002032671, Tadashi Serikawa: "The Size of Liftoff Metallization of Sputtered Aluminum Films".
Research Disclosure, No. 303, Jul. 1989, pg. 549 XP000045877 "Dry Lithographic Process".
Solid State Technology, vol. 26, Sept. 1983, Washington, pp. 174-176, XP002032672 S. J. Gillespie: "Top-edge Imaging in E-beam Lithography".
Microelectronic Engineering vol. 11, No. 1/04, Apr. 1990, pp. 549-552, XP000134655, Witman D F et al: "A Simple Bilayer Lift-off Process".

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