Process for manufacturing transparent, conductive film

Details Process for manufacturing transparent, conductive film Process for manufacturing transparent, conductive film

1990-09-19

1991-05-07

Weisstuch, Aaron

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20419214, 20419229, 20429805, 427 40, C23C 1408, C23C 1432

Patent

active

050134167

ABSTRACT:
A conductive thin film is deposited on the surface of plastic film moving at high velocity by ion-plating using a pressure-gradient discharge. The moving velocity of the substrate film is as high as 8 to 30m/min. A conductive, thin film composed of indium oxide, tin oxide, TTD and similar substances is deposited on the plastic film, at a pressure of 1.times.10.sup.-5 to 1.times.10.sup.-1 Torr and a discharge voltage of 50 to 100 V.

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