Process for manufacturing a ferroelectric device and devices man

Static information storage and retrieval – Systems using particular element – Ferroelectric

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427 58, 427100, 427125, 427126, 4272481, 4272557, 427250, 427261, 427309, 427314, 427380, 4273833, 427404, 4274193, 4274194, G11C 1122, B05D 512

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041953550

ABSTRACT:
A process for manufacturing a ferroelectric device includes the steps of chemically cleaning a substrate, followed by radio frequency etching of the substrate. The substrate is then pre-heated. A first electrical contact is then formed on the substrate, and over a portion of the first electrical contact there is vapor deposited a stable thin film of potassium nitrate. Then a second electrical contact is formed over at least a part of the thin film of potassium nitrate. A covering of silicon monoxide is then vacuum deposited over the assemblage of the first and second electrical contacts and the potassium nitrate. The assemblage is then annealed for approximately twenty-four hours at a temperature of approximately 160.degree. C.

REFERENCES:
patent: 3381256 (1968-04-01), Schuller et al.
patent: 3405440 (1968-10-01), Nolta et al.
patent: 3607386 (1971-09-01), Galla et al.
patent: 3877982 (1975-04-01), Coldren et al.
patent: 3939292 (1976-02-01), Rohrer

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