Process for manufacture of integrated circuit device

Details Process for manufacture of integrated circuit device Process for manufacture of integrated circuit device

1997-11-19

2000-08-29

Duda, Kathleen

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

430327, G03F 726

Patent

active

061106496

ABSTRACT:
The invention relates to a dielectric material and a process for forming an integrated circuit device comprising (i) a substrate; (ii) metallic circuit lines positioned on the substrate and (iii) a dielectric material positioned on the circuit lines. The dielectric material comprises condensed organic polysilica and porous particles.

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R. Japp et al., "Low Dielectric Constant Laminates Containing Microspheres", Mat. Res. Soc. Symp. Proc. vol. 372, pp. 221-245, 1995 Materials Research Society.

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