Semiconductor device manufacturing: process – Forming bipolar transistor by formation or alteration of... – Self-aligned
Patent
1997-06-09
1999-12-14
Fahmy, Wael M.
Semiconductor device manufacturing: process
Forming bipolar transistor by formation or alteration of...
Self-aligned
438202, 438234, 438369, 438527, 148DIG9, 148DIG10, 148DIG11, 257370, 257588, H01L 21331
Patent
active
060017015
ABSTRACT:
A bipolar fabrication process, illustratively suited for integration into a conventional CMOS process to thereby form a BiCMOS integrated circuits is disclosed. The collector and base are formed through multiple implants and a single masking step to thereby provide a continuous low resistance collector region.
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Carroll Michael Scott
Chaudhry Samir
Chen Alan Sangone
Chyan Yih-Feng
Lee Kuo-Hua
Fahmy Wael M.
Grillo A.
Lucent Technologies - Inc.
Pham Long
Rehberg J.
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