Process for making a photoactive compound and photoresist theref

Organic compounds -- part of the class 532-570 series – Organic compounds – Diazooxide or diazotate

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C07C30976, C07C30328, G03F 722

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active

059360712

ABSTRACT:
The present invention provides for process of preparing a photoactive ester compound of high purity using a solid base catalyst, preferably an anionic exchange resin. The invention further provides for preparing and imaging a photosensitive composition comprising such a photoactive compound, a film-forming resin and a solvent composition.

REFERENCES:
patent: 2929808 (1960-03-01), Ross et al.
patent: 3666473 (1972-05-01), Colom et al.
patent: 4033909 (1977-07-01), Papa
patent: 4033910 (1977-07-01), Papa
patent: 4115128 (1978-09-01), Kita
patent: 4173470 (1979-11-01), Fahrenholtz et al.
patent: 4195138 (1980-03-01), Ward
patent: 4250031 (1981-02-01), Uejima et al.
patent: 4452883 (1984-06-01), Frenchik et al.
patent: 4567130 (1986-01-01), Held
patent: 4584261 (1986-04-01), Held
patent: 4588670 (1986-05-01), Kelly et al.
patent: 4636540 (1987-01-01), Warfel
patent: 4721665 (1988-01-01), Dooley et al.
patent: 4747954 (1988-05-01), Vaughn et al.
patent: 4784937 (1988-11-01), Tanaka et al.
patent: 4833067 (1989-05-01), Tanaka et al.
patent: 4853315 (1989-08-01), McKean et al.
patent: 4914006 (1990-04-01), Kato et al.
patent: 5073622 (1991-12-01), Wojtech et al.
patent: 5116715 (1992-05-01), Roland
patent: 5118787 (1992-06-01), Furuno
patent: 5175078 (1992-12-01), Aoyama et al.
patent: 5212044 (1993-05-01), Liang et al.
patent: 5284930 (1994-02-01), Matsumoto et al.
patent: 5286606 (1994-02-01), Rahman et al.
patent: 5300396 (1994-04-01), Khanna et al.
patent: 5300628 (1994-04-01), Honda
patent: 5350714 (1994-09-01), Trefonas, III et al.
patent: 5378802 (1995-01-01), Honda
patent: 5446125 (1995-08-01), Honda et al.
patent: 5472616 (1995-12-01), Szmanda et al.
patent: 5476750 (1995-12-01), Rahman et al.
patent: 5500127 (1996-03-01), Carey et al.
patent: 5501936 (1996-03-01), Hosoda et al.
patent: 5516886 (1996-05-01), Rahman et al.
patent: 5521052 (1996-05-01), Rahman et al.
patent: 5532107 (1996-07-01), Oie et al.
patent: 5541033 (1996-07-01), Blakeney et al.
patent: 5543263 (1996-08-01), Rahman et al.
patent: 5665517 (1997-09-01), Rahman et al.
Bayard; "Water Free of Heavy Metals for Medical Use and Ion Exchange Resin Used in its Preparation" Nov. 16, 1992; CA98(26):221589z.
Hirai et al; "Treatment of Waste Waters Containing Formaldehyde and Metals with Chelating Ion Exchange Resins"; Nov. 5, 1975; CA84(14):95328j.
Kimura et al; "Purification of Formaldehyde"; Mar. 9, 1977; CA87(7):52776y.
T. Tanada; "A New Photolithography Tech. with Antireflective . . . "; Journal of the Electrochemical Society, vol. 137, No. 12, pp. 393900-3905; Dec. 1990, Manchester, New Hampshire.
Rohm and Has Company; "Amberlite Ion Exchange Resins Laboratory Guide"; Sep. 1979; Philadelphia, PA.
JP-A-1190713 Inatomi, Shigeki et al, Jul. 31, 1989; Chemcial Abstracts, vol. 112, No. 18, Apr. 30, 1990, Columbus, OH, p. 17, the Abstract 159201u.
G. Noti et al, "Deionized Water Plants for Semiconductor Device Fabrication", Proceedings of the Inst:Radio and Electronic Eng., Australia, vol. 34, No. 2, Mar. 1973, pp. 45-51.
Derwent Publications Ltd., London, GB; JP-A-05 234 876 (OCG Microelectronic Materials), Sep. 10, 1993.
A. Knop & W. Scheib Chemistry & Application of Phenolic Resins, Chapter 4, Apr. 12, 1996.
J. Kosar, "Light Sensitive Systems", Chapter 7.4, Apr. 12, 1996.
U.S. application No. 08/813,167, filed Mar. 7, 1997.
U.S. application No. 08/812,542, filed Mar. 7, 1997.

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