Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making named article
Reexamination Certificate
2007-01-30
2007-01-30
McPherson, John A. (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making named article
C347S047000
Reexamination Certificate
active
10937968
ABSTRACT:
A device surface of a substrate is dry-sprayed with a polymeric material (e.g., a photoresist) to provide a spray-coated layer on the surface of the substrate. The spray-coated layer has a thickness ranging from about 0.5 to about 20 microns. Flow features are formed (e.g., imaged and developed) in the spray-coated layer. A nozzle plate layer is applied to the spray-coated layer. The nozzle plate layer has a thickness ranging from about 5 to about 40 microns and contains nozzle holes formed therein to provide the micro-fluid ejection head structure.
REFERENCES:
patent: 4558333 (1985-12-01), Sugitani et al.
patent: 4609427 (1986-09-01), Inamoto et al.
patent: 4657631 (1987-04-01), Noguchi
patent: 6409312 (2002-06-01), Mrvos et al.
patent: 6440218 (2002-08-01), Sanada et al.
patent: 6652911 (2003-11-01), Kim et al.
patent: 2002/0145644 (2002-10-01), Chen et al.
Bertelsen Craig M.
Hart Brian C.
Holt, Jr. Gary A.
Weaver Sean T.
Williams Gary R.
Luedeka Neely & Graham
McPherson John A.
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