Electrolysis: processes – compositions used therein – and methods – Electrolytic coating – Coating selected area
Patent
1992-06-17
1993-03-16
Tufariello, T. M.
Electrolysis: processes, compositions used therein, and methods
Electrolytic coating
Coating selected area
C25D 502
Patent
active
051941368
ABSTRACT:
A method of fabricating a display panel, e.g., of the type used in active matrix liquid crystal display devices, includes the steps of forming a transparent, electrically conductive layer, e.g., an indium tin oxide (ITO) layer on an electrically insulating substrate, e.g., a glass substrate; forming an anodizable metal layer, e.g., an aluminjum (Al) layer, on the ITO layer; performing a first anodization step to thereby form an oxidized insulating layer, e.g., an Al.sub.2 O.sub.3 layer, on the Al layer; forming a patterned mask on the Al.sub.2 O.sub.3 layer to provide coverage only over selected regions of the Al.sub.2 O.sub.3 layer; and, performing a second anodization step to anodize all portions of the Al layer except portions thereof disposed beneath the selected regions, which portions remain intact to serve as the gate electrodes/wiring structure of the display panel. In one embodiment, the ITO layer is patterned before the first anodization step is performed, and in another embodiment, the ITO layer is patterned after the second embodiment step is performed. In yet another embodiment, after the Al layer is deposited, a patterned pixel separating layer is formed to provide coverage only over selected portions of the Al layer, i.e., to serve as a mask, so that selected portions of the Al layer are not anodized during the first anodization step, thereby resulting in the formation of a patterned oxide film on the Al layer which is a negative image of the patterned pixel separating layer. Thereafter, a first patterned mask is formed on the patterned oxide film and selected portions of the Al layer to provide coverage over all regions thereof except the desired location of the gate electrode/wiring structures. Then, a second anodization step is carried out to form an Al.sub.2 O.sub.3 layer on areas uncovered by the first patterned mask. Finally, a second patterned mask is formed on the Al.sub.2 O.sub.3 layer, and all portions of the Al layer and the ITO layer which are left uncovered by the second patterned mask are removed, to thereby provide a resultant display panel structure including a matrix of pixel electrodes and gate electrodes/wiring structures.
REFERENCES:
patent: 5060036 (1991-10-01), Choi
Japanese Laying Open Gazette No. 2-85826: Specification in Japanese with English translation; title: Display Panel; Appln. No. 2-85826.
Bae Byungseong
Jeung Sehun
Donohoe Charles R.
Samsung Electronics Co,. Ltd.
Tufariello T. M.
Westerlund Robert A.
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