Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making named article
Patent
1990-03-07
1991-10-15
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making named article
430323, 430394, 163 4, 163 5, G03C 500, B21G 318
Patent
active
050574019
ABSTRACT:
Process for preparing a pointed device by a photochemical process by coating the top and bottom surfaces of a sheet material with a light-sensitive photoresist, exposing the photoresist with light through a light-impenetrable mask in the form of an image of the device shaped with a blunt end at the tip of the point to compensate for lateral etching during the etching step, said image on the top surface being slightly offset relative to the image on the bottom surface, further exposing with light a portion of the image of the point of the device on the top surface of the sheet material, said exposure conforming generally to a V-shaped configuration running along the inside perimeter of the point, removing exposed photoresist, and then contacting the treated sheet material with an etchant to remove material not protected by the remaining photoresist.
REFERENCES:
patent: 2469689 (1949-05-01), Gresham
patent: 3942981 (1976-03-01), Sato
patent: 4587202 (1986-05-01), Borysko
patent: 4711800 (1987-12-01), DiVincenzo
patent: 4777096 (1988-10-01), Borysko
Borysko Emil
Hughes Daniel
Bowers Jr. Charles L.
Chea Thorl
Ethicon Inc.
Goodwin Matthew S.
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