Process for increasing silicon thermal decomposition deposition

Details Process for increasing silicon thermal decomposition deposition Process for increasing silicon thermal decomposition deposition

1980-07-28

1984-08-07

Bernstein, Hiram H.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156DIG89, C30B 2510

Patent

active

044642229

ABSTRACT:
Process for increasing silicon deposition rates from silicon halide-hydrogen reaction gases wherein electronic-grade silicon bodies are produced from the deposition of silicon upon silicon slim rods heated and introduced into and pulled through a chemical vapor deposition chamber, the increased silicon deposition rates resulting from introducing small percentages by weight of silane to the silicon halide-hydrogen reaction gases, for example, silicon tetrachloride and/or trichlorosilane.

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patent: 3496037 (1970-02-01), Jackson, Jr. et al.
patent: 3508962 (1970-04-01), Manasevit et al.
patent: 3969163 (1976-07-01), Wakefield
patent: 4147814 (1979-04-01), Yatsurugi et al.

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