Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent
1981-09-24
1983-07-19
Brammer, Jack P.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
430313, 430316, 430329, 430394, 430502, G03C 500
Patent
active
043944370
ABSTRACT:
The present invention describes conformable masking techniques which can be successfully made and used in a practical manufacturing environment while providing increased resolution of photolithographic images while eliminating all manner of defects that might presently be encountered in the masks currently used in the semiconductor industry.
In the present invention a body is first coated with a positive photoresist overcoated with a conformable mask which is exposed through a fixed mask and developed to define a replica of the fixed mask, together with all its defects. The underlying photoresist is then exposed to light through developed openings in the conformable mask. The conformable mask is then stripped and a new conformable mask laid down. This new conformable mask is now exposed through a second fixed mask having the same image as the first fixed mask, but presumably with different defects and developed to define a replica of the second mask. The underlying photoresist is again exposed through the second conformable mask and developed. As a result of using two independently defined conformable masks clear image defects in the fixed masks are prevented from being reproduced in the underlying photoresist and are not doubly exposed. Only desired regions in the underlying photoresist are doubly exposed.
REFERENCES:
patent: 3317320 (1967-05-01), Reber
patent: 3506441 (1970-04-01), Gottfried
patent: 3518084 (1970-06-01), Barson et al.
patent: 3615464 (1971-10-01), Agosta et al.
patent: 3615466 (1971-10-01), Sahni
patent: 3647445 (1972-03-01), Burns
patent: 3823015 (1974-07-01), Fassett
patent: 3955981 (1976-05-01), Stachniak
IBM Technical Disclosure Bulletin, vol. 21, #5, 10/78, p. 2133, B. J. Lin, "Portable Intimately Contacted Mask".
IBM Technical Disclosure Bulletin, vol. 13, #10, 03/71, p. 3080, J. J. Lajza, Jr., "Eliminating Clear Type Mask Defects in . . .".
IBM Research Report #RC 7578, Mar. 26, 1979, B. J. Lin, "Optical Methods for Fine-Line Lithography".
Bergendahl Albert S.
Hakey Mark C.
Wilson John P.
Brammer Jack P.
International Business Machines - Corporation
Thornton Francis J.
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