Process for holding an object

Details Process for holding an object Process for holding an object

1995-08-28

1997-10-21

Wong, Don

X-ray or gamma ray systems or devices

Specific application

Lithography

25044311, 279 3, B32B 3104

Patent

active

056804288

ABSTRACT:
Disclosed are an object holding process and and an apparatus therefor in which a process strain of the object can be accurately compensated for. When the exposure operation is started, the bottom surface of the object is held by a holding unit. If the object has a strain, the process strain is calculated. Here, if the process strain is larger than a tolerance, the temperature of the object is set to an object setting temperature in a position other than an exposure position in order to contract or expand the object by a predetermined amount for a magnification correction. The bottom surface of the object is then held by the holding unit again, and the exposure of the object is performed in the exposure position.

REFERENCES:
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patent: 5093579 (1992-03-01), Amemiya et al.
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patent: 5138643 (1992-08-01), Sakamoto et al.
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patent: 5172189 (1992-12-01), Mitome
patent: 5172402 (1992-12-01), Mizusawa et al.
patent: 5172403 (1992-12-01), Tanaka
patent: 5191218 (1993-03-01), Mori et al.
patent: 5231291 (1993-07-01), Amemiya
patent: 5281297 (1994-01-01), Lee

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