Process for growing a thin metallic film

Coating processes – Coating by vapor – gas – or smoke – Metal coating

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

4272551, 427282, C23C 1604, C23C 1606

Patent

active

053167961

ABSTRACT:
A chemical vapor deposition process for growing a thin metallic film of copper or gold on a substrate includes providing a starting material composed of a .beta.-ketonato type metal complex of gold or copper in a heated container; preparing a carrier gas for the starting material which is composed of hydrogen as a reducing agent and at least one electron donating substance which bonds to and forms a molecular compound with the starting material by donating an electron to the starting material; passing a flow of the carrier gas through the heated container containing the starting material to form the molecular compound in situ and provide a flow of a gas mixture; introducing the flow of the gas mixture into a reaction chamber in which a substrate is positioned; and growing gold or copper on the substrate by thermally decomposing the molecular compound and any remaining starting material under temperature conditions effective therefor.

REFERENCES:
patent: 2576289 (1951-11-01), Fink
patent: 2704728 (1955-03-01), Pawlyk
patent: 2760261 (1956-08-01), Pawlyk
patent: 2833676 (1958-05-01), Heibel et al.
patent: 3356527 (1967-12-01), Moshier
patent: 3356527 (1967-12-01), Moshier et al.
patent: 3697342 (1972-10-01), Cuomo
patent: 4387134 (1983-06-01), Kalbskopf et al.
patent: 4842891 (1989-06-01), Miyazaki et al.
patent: 5019531 (1991-05-01), Awaya et al.
patent: 5098516 (1992-03-01), Norman et al.
Houle et al., "Surface Processes Leading to Carbon Contamination . . . " J. Vac. Sci. Technol. A 4 (6) Nov./Dec. 1986, pp. 2452-2458.
Oehr et al., "Thin Copper Films by Plasma CVD Using . . . " Appl. Phys. A 45, 151-154 (1988).
"Photochemical Generation and Deposition . . . " by Ioues et al., Jan. 1985, American Institute of Physics.
"Vapor Deposition of Metals by . . . " by Van Hemest et al., Nov. 1965, vol. 112, No. 11, University of California.
"Chemical Vapor Depositon of Metals for Integrated Circuit Applications" Green et al., Journal of Metals, Jun. 1985, pp. 63-71.
"Coating the Inside Surfaces of Hollow Sections with a Tantalum Layer for Corrosion Protection", Hiever et al., Siemens Forsch. Entwickl, Springer-Verlag 1977, 232 235.
"Tungsten Contact Hole Filling in a High Vacuum CVD-System", Hieber et al., Jun. 15-16 1987 V-MIC Conf. IEEE, pp. 216-223.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Process for growing a thin metallic film does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for growing a thin metallic film, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for growing a thin metallic film will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1626691

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.