Process for generating positive-tone photoresist image

Details Process for generating positive-tone photoresist image Process for generating positive-tone photoresist image

1991-12-06

1993-07-20

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

430325, 430328, 430330, 430394, 156643, 156646, G03C 500

Patent

active

052292568

ABSTRACT:
The present invention relates to a multistep process for generating a positive tone photoresist image with dry development.

REFERENCES:
patent: 4491628 (1985-01-01), Ito et al.
patent: 4552833 (1985-11-01), Ito et al.
patent: 4613398 (1986-09-01), Chiong et al.
patent: 4657845 (1987-04-01), Frechet et al.
patent: 4810601 (1989-03-01), Allen et al.
patent: 5037721 (1991-08-01), Doessel
Ito et al., "Thermolysis and Photochemical Acidolysis of Selected Polymethacrylates", American Chem. Soc., 1988.
Coopmans et al., "DESIRE: A Novel Dry Developed Resist System", SPIE vol. 631, Advances in Resist Technology and Processing III (1986).
Meyer et al., "Plasma Developable Positive UV-Resisto", Elevier Science Publishers, B. V. (North-Holland), 1983.
Ito et al., "Thermally Developable, Positive Tone, Oxygen RIE Barrier Resist for Bilayer Lithography, IBM Research Division", Almaden Research Center, San Jose, Calif., 1989, pp. 245-249.
Ito et al., "Highly Sensitive Thermally Developable Positive Resist Systems", IBM Research Division, Almaden Research Center, San Jose, Calif., 1988, pp 2259-2263.

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