Process for forming resist pattern

Details Process for forming resist pattern Process for forming resist pattern

1990-12-19

1993-11-02

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Post imaging radiant energy exposure

430322, 430325, 430331, G03C 500

Patent

active

052582671

ABSTRACT:
Disclosed is a process for forming a resist pattern, which comprises coating a resist material on a film to be processed, to form a resist film, exposing the resist film to light of a predetermined pattern to form a latent image corresponding to the light pattern, and subjecting the resist film to a development treatment while irradiating the resist film with pulsating rays of the infrared wavelength region at a temperature lower than room temperature. According to this process, a malforming of the pattern due to a swelling of the resist at the development stage is prevented, and an excellent pattern having a high resolving power can be formed.

REFERENCES:
patent: 4361642 (1982-11-01), Grossa
patent: 4737446 (1988-04-01), Cohen

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