Process for forming resist masks utilizing O-quinone diazide and

Details Process for forming resist masks utilizing O-quinone diazide and Process for forming resist masks utilizing O-quinone diazide and

1982-12-30

1984-08-07

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

430156, 430171, 430165, 430166, 430191, 430193, 430311, 430330, 430326, 430323, G03F 726

Patent

active

044644582

ABSTRACT:
A resist system for semiconductor device fabrication comprised of bottom positive resist layer of a diazoquinone
ovolak resist applied to a substrate and overcoated with a like or different diazoquinone
ovolak top resist layer which has been sensitized with pyrene and/or its derivatives.

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