Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1984-11-15
1986-12-16
Williams, Howard S.
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
C23C 1412, C23C 1418
Patent
active
046295470
ABSTRACT:
A protective film having a very low coefficient of friction, a good wear resistance, a good adhesion, and prolonged lubricating and moisture-resistant properties is formed on a substrate by sputtering of a target consisting of at least one of organic polymers and at least one of boron compounds.
REFERENCES:
patent: 3583899 (1971-06-01), Aronson
patent: 4390601 (1983-06-01), Ono et al.
patent: 4525417 (1985-06-01), Dimigen et al.
Honda Yoshinori
Kitoo Makoto
Kokaku Yuuichi
Hitachi , Ltd.
Williams Howard S.
LandOfFree
Process for forming protective film of organic polymer and boron does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process for forming protective film of organic polymer and boron, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for forming protective film of organic polymer and boron will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-244190