Process for forming metal oxide film by means of CVD system

Details Process for forming metal oxide film by means of CVD system Process for forming metal oxide film by means of CVD system

1999-03-24

2000-09-12

Nazario-Gonzalez, Porfirio

Coating processes

Coating by vapor, gas, or smoke

Mixture of vapors or gases utilized

556 54, 556 81, 4272555, 4272556, 427576, 427581, 427584, 427587, 427593, C23C 1600, H05H 124, C07F 728

Patent

active

061174874

ABSTRACT:
A process for forming a metal oxide film by means of a chemical vapor deposition system, which comprises using a complex of a .beta.-diketone compound and a group IV metal glycolate, the complex being represented by formula (I): ##STR1## wherein M represents a metal atom of the group IV; R.sup.1 and R.sup.2 each represent a branched alkyl or cycloalkyl group having 4 to 8 carbon atoms; and R.sup.3 represents a straight-chain or branched alkylene group having 2 to 18 carbon atoms.

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patent: 5389401 (1995-02-01), Gordon
patent: 5527567 (1996-06-01), Desu et al.
patent: 5618575 (1997-04-01), Peter

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