Process for forming magnetic film pattern

Details Process for forming magnetic film pattern Process for forming magnetic film pattern

1982-06-09

1984-04-17

Smith, John D.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156664, 252 792, 427130, 29603, 430318, C23F 1700, H05K 306

Patent

active

044432941

ABSTRACT:
In forming a magnetic film pattern of permalloy by photoetching, the permalloy magnetic film formed on a substrate is etched in an etching solution containing ferric chloride, hydrochloric acid and phosphoric acid, thereby gradually reducing the thickness of the film pattern at the side edges in a tapered state. The permalloy magnetic film can be easily taper-etched without any deterioration of magnetic properties of permalloy magnetic film and substrate surface, but with a greatly improved yield of magnetic film head production and a greatly improved reliability.

REFERENCES:
patent: 3677843 (1972-07-01), Reiss
Circuits Manufacturing, vol. 18, No. 8, Aug. 1978, p. 20, Wiesner, H. J., "Etching Thick-Film Circuits".

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