Chemistry of inorganic compounds – Silicon or compound thereof – Oxygen containing
Patent
1989-11-22
1991-01-08
Doll, John
Chemistry of inorganic compounds
Silicon or compound thereof
Oxygen containing
423335, 423339, 502 8, 502 10, C01B 3312, B01J 3508
Patent
active
049833693
ABSTRACT:
A process for producing highly uniform microspheres of silica having an average diameter of 0.1-10 .mu.m from the hydrolysis of a silica precursor, such as tetraalkoxysilanes, which is characterized by employing precursor solutions and feed rates which initially yield a two-phase reaction mixture.
REFERENCES:
patent: 3634558 (1972-01-01), Stober
patent: 4567030 (1986-01-01), Yuasa et al.
patent: 4775520 (1988-10-01), Unger et al.
Controlled Growth of Monodisperse Silica Spheres in the Micron Size Range, Stober et al., Journal of Colloid and Interface Science 26, 62-69, (1968).
Barder Timothy J.
DuBois Philip D.
Allied-Signal Inc.
Cuomo Lori F.
Doll John
Fuchs Gerhard H,.
Rooney Gerard P.
LandOfFree
Process for forming highly uniform silica spheres does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process for forming highly uniform silica spheres, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for forming highly uniform silica spheres will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-933203