Process for forming fluorinated resin or amorphous carbon layer

Details Process for forming fluorinated resin or amorphous carbon layer Process for forming fluorinated resin or amorphous carbon layer

1998-02-18

2000-04-11

Crane, Sara

Semiconductor device manufacturing: process

Coating with electrically or thermally conductive material

To form ohmic contact to semiconductive material

438623, 438725, 438778, 438780, H01L 214763

Patent

active

060487860

ABSTRACT:
A resin or amorphous carbon layer is coated on a substrate and then fluorinated by exposing it in a F.sub.2 gas atmosphere. The thus fluorinated resin or amorphous carbon layer can be excellent in dielectric constant and thermal resistance. The resin may be photo-sensitive so that the resin can be patterned before the fluorination. Alternatively, the resin can be fluorinated before patterning.

REFERENCES:
patent: 4144374 (1979-03-01), Lagow et al.
patent: 4296151 (1981-10-01), Boultinghouse
patent: 4491653 (1985-01-01), McGinniss et al.
patent: 4717623 (1988-01-01), Brown et al.
patent: 4906198 (1990-03-01), Weinberg
patent: 5073785 (1991-12-01), Jansen et al.
patent: 5137754 (1992-08-01), Watanabe
patent: 5149744 (1992-09-01), Tarancon
patent: 5312716 (1994-05-01), Unoki et al.
patent: 5387495 (1995-02-01), Lee et al.
patent: 5578278 (1996-11-01), Fall et al.
patent: 5627079 (1997-05-01), Gardella, Jr. et al.
H.Y. Lu et al., J. Vac. Sci. Technol. A. vol. 10, No. 3, 450 (1992).
R.J. Lagow et al., Polymer Letters Edition, vol. 12, pp. 177-184 (1984).
Mitsubishi, Derwent Abstract For Commercial Data base--89-035739 of Japanese Patent Document 63-308920 A dated Dec. 16, 1988.

Affiliated with

Also associated with

Rating

Process for forming fluorinated resin or amorphous carbon layer does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for forming fluorinated resin or amorphous carbon layer , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for forming fluorinated resin or amorphous carbon layer will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1176189