Process for forming conductive through-holes through a dielectri

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

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29853, 29882, 156644, 156645, 156652, 156902, 174 685, 427 97, 430313, 430317, 430318, B44C 122, C03C 1500, C03C 2506, C23F 102

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045170509

ABSTRACT:
A conductive through-hole hole is formed through a dielectric sandwiched between conductors by forming a noncircular hole in a conductor, etching a hole through the dielectric and by deforming at the conductor which has been undercut during the etching.

REFERENCES:
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patent: 3186883 (1965-06-01), Frantzen
patent: 3557446 (1971-01-01), Charschan
patent: 3969815 (1976-07-01), Hacke et al.
patent: 4023999 (1977-05-01), Lindberg et al.
patent: 4184909 (1980-01-01), Chang et al.
patent: 4289573 (1981-09-01), Economy et al.
patent: 4319708 (1982-03-01), Lomerson
J. W. Coburn, "Plasma Etching", pp. 1-7.
CPI Prior Art Search Report, J. P. Daniszewski, pp. 2-8.

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