Process for forming a mixed layer of a plasma sprayed material a

Details Process for forming a mixed layer of a plasma sprayed material a Process for forming a mixed layer of a plasma sprayed material a

1991-09-30

1994-05-24

King, Roy V.

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

427449, 427450, 427572, 427249, 427122, 423446, 428408, B05D 306, B05D 100

Patent

active

053147260

ABSTRACT:
A process for forming a diamond gas phase synthesized coating film which is easily controlled and affords a high quality, good adhesion strength diamond film includes a step of forming a mixed layer of a plasma spraying material and diamond by simultaneously conducting plasma injection by a plasma spraying, a first torch and plasma CVD by a CVD plasma, second torch to thereby form a mixed layer on the substrate. The first and second torches are structurally distinct and have respective, separately and selectively controlled plasma generation operating conditions.

REFERENCES:
patent: 4892751 (1990-01-01), Miyake et al.
patent: 4928879 (1990-05-01), Rotolico
patent: 4981717 (1991-01-01), Thaler
patent: 5047612 (1991-09-01), Savkar et al.
Kurihara et al., "Formation of functionally gradient diamond films", Mater. Sci. Monogr., 73 (Appl. Diamond Films Relat. Mater.), pp. 461-466, 1991.
Kitahama et al., "Synthesis of diamond by laser-induced chemical vapor deposition", Appl. Phys. lett. 49(11) Sep. 1986 pp. 634-635.
Patent Abstracts of Japan, vol. 9, No. 17 (C-262)(1740) Jan. 24, 1985 & JP-A-59 166 673 (Mitsubishi Kinzoku K.K.) Sep. 20, 1984.

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