Etching a substrate: processes – Forming or treating optical article
Patent
1998-03-03
2000-09-12
Gulakowski, Randy
Etching a substrate: processes
Forming or treating optical article
385146, G02B 601
Patent
active
061173460
ABSTRACT:
A process for forming a microstructure at a surface of a substrate made of a ferroelectric single crystal, includes the steps of subjecting the substrate to a single-poling treatment, thereby one of an etching-easy surface and an etching-difficult surface being exposed to one of main faces of the substrate, while the other being exposed to the other main face, forming a domain-inverted region in at least one of the main faces of the substrate, and forming the microstructure at the substrate in the domain-inverted region of the substrate by selectively etching the substrate.
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patent: 5664032 (1997-09-01), Bischel et al.
Iwasa: "Chemical etching and fabrication of ridge waveguides on Bi.sub.12 GeO.sub.20 " Journal of Applied Physics., vol. 47, No. 6, New York US, pp. 2746-2748, XP002073626.
Patent Abstracts of Japan vol. 15, No. 167 (C-0872), Apr. 26, 1991 & JP 03 037194 A (Sumitomo Metal Mining Co Ltd).
Patent Abstracts of Japan vol. 17, No. 643 (P-1651), Nov. 29, 1993 & JP 05 210132 A (Sony Corp.).
Patent Abstracts of Japan vol. 17, No. 291 (C-1067), Jun. 4, 1993 & JP 05 017295 A (Ibiden Company Ltd).
Imaeda Minoru
Kawaguchi Tatsuo
Gulakowski Randy
NGK Insulators Ltd.
Olsen Allan
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