Exposure control apparatus based on multimetering system

Details Exposure control apparatus based on multimetering system Exposure control apparatus based on multimetering system

1981-11-06

1984-04-17

Adams, Russell E.

G03B 728, G03B 708

Patent

active

044430809

ABSTRACT:
Exposure control apparatus has a multimetering system in which an object plane is divided into a plural areas to produce a plural number of photometric outputs. From the outputs one photometric output is selected as a reference output for determining the exposure value. The reference value is further changed according to the characteristic of the object field in such manner as to provide the most optimum exposure for it.

REFERENCES:
patent: 4306787 (1981-12-01), Fukuhara et al.
patent: 4309091 (1982-01-01), Fukuhara et al.
patent: 4364650 (1982-12-01), Terashita et al.

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