Process for forming a lithographic mask

Details Process for forming a lithographic mask Process for forming a lithographic mask

1987-04-15

1988-03-15

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156645, 156646, 156652, 156655, 156657, 1566591, 156662, 156668, B44C 122, C03C 1500, C03C 2506, B29C 3700

Patent

active

047311550

ABSTRACT:
A process is provided for forming a patterned layer of a polymeric material on a substrate for the lithographic processing thereof. A layer of polymeric material is formed on the substrate, embossed to form a pattern of peaks and valleys and dry etched to remove the residual polymeric material in the valleys, thereby exposing a portion of the substrate surface.

REFERENCES:
patent: 3923566 (1975-12-01), Law
patent: 4357369 (1982-11-01), Kilichowski et al.
patent: 4670095 (1987-06-01), Negishi

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