Process for forming a high resolution recording medium

Details Process for forming a high resolution recording medium Process for forming a high resolution recording medium

1980-01-29

1982-11-16

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making named article

156636, 156637, 156639, 156640, 156643, 1566591, 1566611, 428195, 428913, 430 8, 430293, 430294, 430323, 430324, 430329, G03C 500, G03C 700, G02B 528, B44F 108

Patent

active

043595197

ABSTRACT:
A process for forming a high resolution recording medium including at least a high resolution, patterned interference filter formed from at least two reflecting layers separated by an interference layer including the step of removing patterned portions of a reflective layer not protected by a photosensitive layer by means of chemical etching or ion beam etching. When chemical etching is used, the etching process is accelerated to reduce under-etching by maintaining a rapid, thorough, and continuous boundary surface exchange of the etching solution at the boundary between the etching solution and the reflective layer being etched.

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patent: 4151321 (1979-04-01), Hiesinger
patent: 4258126 (1981-03-01), Hiesinger
IBM Tech. Disclosure Bulletin, vol. 15, No. 5, Oct. 1972, Making Iron Oxide Masks.
Kodak Publication, p. 131, "Chemical Milling with Kodak Photosensitive Resists", 1968, pp. 15, 18.

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